FILE PHOTO: Workers are seen in front of a “High NA EUV” lithography system at an Intel facility in Hillsboro, Oregon, U.S. in this handout image obtained by Reuters on April 19, 2024. Intel Corporation/Handout via REUTERS/File Photo
FILE PHOTO: Workers are seen in front of a “High NA EUV” lithography system at an Intel facility in Hillsboro, Oregon, U.S. in this handout image obtained by Reuters on April 19, 2024. Intel Corporation/Handout via REUTERS/File Photo